Selective directed self-assembly of coexisting morphologies using block copolymer blends
There is a limited range of structures available in nanolithography using directed self-assembled block copolymers. Here, Black and co-workers expand directed self-assembly chemical patterning by using a blend of lamellar and cylinder forming block copolymers on surface chemical line gratings.
| Main Authors: | , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Nature Publishing Group
2016-08-01
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| Series: | Nature Communications |
| Online Access: | https://doi.org/10.1038/ncomms12366 |