Metrology of Nanostructures by Tomographic Mueller-Matrix Scatterometry
The development of necessary instrumentation and metrology at the nanoscale, especially fast, low-cost, and nondestructive metrology techniques, is of great significance for the realization of reliable and repeatable nanomanufacturing. In this work, we present the application of a homemade novel opt...
Main Authors: | Chao Chen, Xiuguo Chen, Yating Shi, Honggang Gu, Hao Jiang, Shiyuan Liu |
---|---|
Format: | Article |
Language: | English |
Published: |
MDPI AG
2018-12-01
|
Series: | Applied Sciences |
Subjects: | |
Online Access: | https://www.mdpi.com/2076-3417/8/12/2583 |
Similar Items
-
Métrologie des dimensions critiques : scatterométrie et développements avancés
by: Vauselle, Alexandre
Published: (2013) -
Classification par réseaux de neurones dans le cadre de la scattérométrie ellipsométrique
by: Zaki, Sabit Fawzi Philippe
Published: (2016) -
Dependence-Analysis-Based Data-Refinement in Optical Scatterometry for Fast Nanostructure Reconstruction
by: Zhengqiong Dong, et al.
Published: (2019-09-01) -
Développement de la technique de scattérométrie neuronale dynamique
by: El Kalioubi, Ismail
Published: (2015) -
Mueller matrix ellipsometry on advanced nanostructures
by: Magnusson, Roger
Published: (2008)