Metrology of Nanostructures by Tomographic Mueller-Matrix Scatterometry

Metrology of Nanostructures by Tomographic Mueller-Matrix Scatterometry

The development of necessary instrumentation and metrology at the nanoscale, especially fast, low-cost, and nondestructive metrology techniques, is of great significance for the realization of reliable and repeatable nanomanufacturing. In this work, we present the application of a homemade novel opt...

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Bibliographic Details
Main Authors: Chao Chen, Xiuguo Chen, Yating Shi, Honggang Gu, Hao Jiang, Shiyuan Liu
Format: Article
Language:English
Published: MDPI AG 2018-12-01
Series:Applied Sciences
Subjects:
ellipsometry
scatterometry
Mueller matrix
diffraction grating
inverse scattering
pitch measurement
Online Access:https://www.mdpi.com/2076-3417/8/12/2583

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https://www.mdpi.com/2076-3417/8/12/2583

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