Modeling and stability analysis of the nonlinear reactive sputtering process
The model of the reactive sputtering process has been determined from the dynamic equilibrium of the reactive gas inside the chamber and the dynamic equilibrium of the sputtered metal atoms which form the compound with the reactive gas atoms on the surface of the substrate. The analytically obtained...
| Main Authors: | , , |
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| Format: | Article |
| Language: | English |
| Published: |
Editura Universităţii "Petru Maior"
2011-12-01
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| Series: | Scientific Bulletin of the ''Petru Maior" University of Tîrgu Mureș |
| Subjects: | |
| Online Access: | http://scientificbulletin.upm.ro/papers/2011/12/Gy%C3%B6rgy-Katalin-Kelemen-Andr%C3%A1s-Papp-S%C3%A1ndor-Modeling-and-stability-analysis-of-the-nonlinear-reactive-sputtering-process1.pdf |