Imperfect two-dimensional topological insulator field-effect transistors

A challenge of using 2D materials for nanoelectronic devices is the need for defect-free lattice supporting efficient carrier transport. Here, the authors show theoretically that 2D topological insulators enable high-performance, low-power field-effect transistors without requiring defect-free mater...

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Bibliographic Details
Main Authors: William G. Vandenberghe, Massimo V. Fischetti
Format: Article
Language:English
Published: Nature Publishing Group 2017-01-01
Series:Nature Communications
Online Access:https://doi.org/10.1038/ncomms14184