Controlled fluoridation of amorphous carbon films deposited at reactive plasma conditions
A study of the correlations between plasma parameters, gas ratios, and deposited amorphous carbon film properties is presented. The injection of a C4F8/Ar/N2 mixture of gases was successfully used in an inductively coupled plasma system for the preparation of amorphous carbon films with different fl...
| Main Authors: | , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Sciendo
2015-09-01
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| Series: | Materials Science-Poland |
| Subjects: | |
| Online Access: | http://www.degruyter.com/view/j/msp.2015.33.issue-3/msp-2015-0088/msp-2015-0088.xml?format=INT |