Pulsed 1064 nm Nd-YAG Laser Deposition of Titanium on Silicon in a Nitrogen Environment

Pulsed 1064 nm Nd-YAG Laser Deposition of Titanium on Silicon in a Nitrogen Environment

Pulsed laser deposition (PLD) technique was demonstrated for the deposition of titanium nitride (TiN) thin films on Si (100) substrates. A 1064 nm pulsed Nd-YAG laser is focused on a titanium (99.5%) target in a nitrogen environment to generate the atomic flux needed for the film deposition. Spectro...

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Bibliographic Details
Main Authors: Wilson Garcia, Jose Omar Amistoso, Edgardo Pabit, Marilyn Hui
Format: Article
Language:English
Published: University of the Philippines 1999-12-01
Series:Science Diliman
Subjects:
laser deposition
titanium nitride
laser-induced plasma
Online Access:http://journals.upd.edu.ph/index.php/sciencediliman/article/view/241

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