Improving the performance properties of thin-film silicon-containing coatings by optimizing the operation of the gas supply system of the plasma chemical machine

• Main Author: A.L.
• Format: Article
• Language: English
• Published: Zhytomyr Polytechnic State University 2021-06-01
• Series: Технічна інженерія
• Subjects: thin-film silicon-containing coatings; plasma chemical machine; plasmatron
• Online Access: http://ten.ztu.edu.ua/article/view/234343

Aspects of improving the operational properties of thin-film silicon-containing coatings by optimizing the operation of the gas supply system of the plasma-chemical plant for their deposition from arc plasma at atmospheric pressure are considered. To improve the operational properties of the applied thin-film coatings, by optimizing the design of the feeder and its operating mode, a full-factor experiment was carried out in order to determine the effect of the flow rate of the carrier gas saturated with vapours of additional reagents on the microhardness of the coating-substrate composition, which affects the operational properties (strength, wear resistance). The author, on the basis of experimental studies, determined the boundaries of the intervals of consumption of the main and transporting gases to create the required concentration of reagents in the plasma jet. As a result of the full-factor experiment and the study of the mathematical model, new data were obtained on the ratios of the transporting gas flows in the feeder containing the reagents necessary for the process. On the basis of the data obtained, the operation of the gas supply system of the plasmatron was optimized by introducing special nozzles into the design of the feeder that ensure the specified flow rate ratios, which made it possible to simplify and increase the speed and accuracy of the regulation and adjustment processes, as well as the stability of maintaining the modes, and thereby increasing the operational properties. the resulting thin-film coatings.