Analysis of Current Research Status of Plasma Etch Process Model

Analysis of Current Research Status of Plasma Etch Process Model

This paper summarizes the status of the plasma etch process modeling research. It mainly introduces typical etching models employing the analytical method, geometric method, system identification method, basic principle simulation method, as well as empirical model. Each model’s basic principles, ap...

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Bibliographic Details
Main Authors: Xiaoting Li, Rui Chen, Lei Qu, Xuanmin Zhu, Jing Zhang, Yanrong Wang, Shuhua Wei, Jiang Yan, Yayi Wei
Format: Article
Language:English
Published: JommPublish 2018-08-01
Series:Journal of Microelectronic Manufacturing
Subjects:
plasma etching
etching model
simulation
Online Access:http://www.jommpublish.org/p/16/

Internet

http://www.jommpublish.org/p/16/

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