High-Performance Red Lasers With Low Beam Divergence

We report the design and fabrication of high-performance 650-nm lasers using a novel wafer structure that offers substantially independent control of the vertical far field and of the optical confinement factor. By incorporating a graded V-shaped layer into the epitaxial structure, a low divergence...

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Bibliographic Details
Main Authors: Bocang Qiu, O. P. Kowalski, Stewart McDougall, B. Schmidt, John H. Marsh
Format: Article
Language:English
Published: IEEE 2009-01-01
Series:IEEE Photonics Journal
Subjects:
Online Access:https://ieeexplore.ieee.org/document/5208180/