Influence of Alumina Addition on the Optical Properties and the Thermal Stability of Titania Thin Films and Inverse Opals Produced by Atomic Layer Deposition

TiO<sub>2</sub> thin films deposited by atomic layer deposition (ALD) at low temperatures (<100 °C) are, in general, amorphous and exhibit a smaller refractive index in comparison to their crystalline counterparts. Nonetheless, low-temperature ALD is needed when the substrates or temp...

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Bibliographic Details
Main Authors: Martin Waleczek, Jolien Dendooven, Pavel Dyachenko, Alexander Y. Petrov, Manfred Eich, Robert H. Blick, Christophe Detavernier, Kornelius Nielsch, Kaline P. Furlan, Robert Zierold
Format: Article
Language:English
Published: MDPI AG 2021-04-01
Series:Nanomaterials
Subjects:
Online Access:https://www.mdpi.com/2079-4991/11/4/1053