Properties of Erbium Doped Hydrogenated Amorphous Carbon Layers Fabricated by Sputtering and Plasma Assisted Chemical Vapor Deposition

We report about properties of carbon layers doped with Er<sup>3+</sup> ions fabricated by Plasma Assisted Chemical Vapor Deposition (PACVD) and by sputtering on silicon or glass substrates. The structure of the samples was characterized by X-ray diffraction and their composition was dete...

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Bibliographic Details
Main Authors: V. Prajzler, Z. Burian, V. Jeřábek, I. Hüttel, J. Špirková, J. Gurovič, J. Oswald, J. Zavadil, V. Peřina
Format: Article
Language:English
Published: CTU Central Library 2008-01-01
Series:Acta Polytechnica
Subjects:
Online Access:https://ojs.cvut.cz/ojs/index.php/ap/article/view/943