Formation of Al2O3-HfO2 Eutectic EBC Film on Silicon Carbide Substrate
The formation mechanism of Al2O3-HfO2 eutectic structure, the preparation method, and the formation mechanism of the eutectic EBC layer on the silicon carbide substrate are summarized. Al2O3-HfO2 eutectic EBC film is prepared by optical zone melting method on the silicon carbide substrate. At high t...
Main Authors: | Kyosuke Seya, Shunkichi Ueno, Byung-Koog Jang |
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Format: | Article |
Language: | English |
Published: |
Hindawi Limited
2015-01-01
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Series: | Journal of Nanomaterials |
Online Access: | http://dx.doi.org/10.1155/2015/318278 |
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