Formation of Al2O3-HfO2 Eutectic EBC Film on Silicon Carbide Substrate

The formation mechanism of Al2O3-HfO2 eutectic structure, the preparation method, and the formation mechanism of the eutectic EBC layer on the silicon carbide substrate are summarized. Al2O3-HfO2 eutectic EBC film is prepared by optical zone melting method on the silicon carbide substrate. At high t...

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Bibliographic Details
Main Authors: Kyosuke Seya, Shunkichi Ueno, Byung-Koog Jang
Format: Article
Language:English
Published: Hindawi Limited 2015-01-01
Series:Journal of Nanomaterials
Online Access:http://dx.doi.org/10.1155/2015/318278