Floating Ni Capping for High-Mobility p-Channel SnO Thin-Film Transistors

We utilized Ni as a floating capping layer in p-channel SnO thin-film transistors (TFTs) to improve their electrical performances. By utilizing the Ni as a floating capping layer, the p-channel SnO TFT showed enhanced mobility as high as 10.5 cm<sup>2</sup>·V<sup>−1</sup>·s&l...

Full description

Bibliographic Details
Main Authors: Min-Gyu Shin, Kang-Hwan Bae, Hyun-Seok Cha, Hwan-Seok Jeong, Dae-Hwan Kim, Hyuck-In Kwon
Format: Article
Language:English
Published: MDPI AG 2020-07-01
Series:Materials
Subjects:
Online Access:https://www.mdpi.com/1996-1944/13/14/3055