Stability and symmetry of ion-induced surface patterning
Abstract We present a continuum model of ion-induced surface patterning. The model incorporates the atomic processes of sputtering, re-deposition and surface diffusion, and is shown to display the generic features of the damped Kuramoto-Sivashinsky (KS) equation of non-linear dynamics. Linear and no...
| Main Authors: | , , |
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| Format: | Article |
| Language: | English |
| Published: |
SpringerOpen
2017-06-01
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| Series: | Materials Theory |
| Online Access: | http://link.springer.com/article/10.1186/s41313-017-0005-1 |