Structural Properties and Oxidation Resistance of ZrN/SiN<sub>x</sub>, CrN/SiN<sub>x</sub> and AlN/SiN<sub>x</sub> Multilayered Films Deposited by Magnetron Sputtering Technique

Structural Properties and Oxidation Resistance of ZrN/SiN<sub>x</sub>, CrN/SiN<sub>x</sub> and AlN/SiN<sub>x</sub> Multilayered Films Deposited by Magnetron Sputtering Technique

In the present work, the structure, stress state and phase composition of MeN/SiN<sub>x</sub> (Me = Zr, Cr, Al) multilayered films with the thickness of elementary layers in nanoscale range, as well as their stability to high temperature oxidation, were studied. Monolithic (reference) an...

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Bibliographic Details
Main Authors: Ihar Saladukhin, Gregory Abadias, Vladimir Uglov, Sergey Zlotski, Arno Janse van Vuuren, Jacques Herman O’Connell
Format: Article
Language:English
Published: MDPI AG 2020-02-01
Series:Coatings
Subjects:
multilayered film
metal nitride
silicon nitride
oxidation
Online Access:https://www.mdpi.com/2079-6412/10/2/149

Internet

https://www.mdpi.com/2079-6412/10/2/149

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