Directed Self-Assembly of Block Copolymer for Bit Patterned Media with Areal Density of 1.5 Teradot/Inch2 and Beyond
Directed self-assembly (DSA) of block copolymer (BCP) holds great promise for many applications in nanolithography, including the next generation magnetic recording. In this work, directed self-assembly of block copolymer technique has been combined with rotary stage electron beam mastering to fabri...
| Main Authors: | , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Hindawi Limited
2013-01-01
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| Series: | Journal of Nanomaterials |
| Online Access: | http://dx.doi.org/10.1155/2013/615896 |