Atomic Layer Deposition
Atomic layer deposition (ALD) is a thin film deposition process renowned for its ability to produce layers with unrivaled control of thickness and composition, conformability to extreme three-dimensional structures, and versatility in the materials it can produce. These range from multi-component co...
| Format: | eBook |
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| Language: | English |
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Basel, Switzerland
MDPI - Multidisciplinary Digital Publishing Institute
2020
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| Online Access: | Open Access: DOAB: description of the publication Open Access: DOAB, download the publication |