Advances in Chemical Vapor Deposition

Advances in Chemical Vapor Deposition

Pursuing a scalable production methodology for materials and advancing it from the laboratory to industry is beneficial to novel daily-life applications. From this perspective, chemical vapor deposition (CVD) offers a compromise between efficiency, controllability, tunability and excellent run-to-ru...

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Bibliographic Details
Format: eBook
Language:English
Published: Basel, Switzerland MDPI - Multidisciplinary Digital Publishing Institute 2021
Subjects:
Technology: general issues
2D
aerosol assisted CVD
Al2O3
aluminum oxide
aluminum tri-sec-butoxide
ammonium metavanadate
anatase single crystals
APCVD
atmospheric pressure CVD
atomic layer deposition
carbon nanotubes
chemical vapor deposition
competitive growth
computational fluid dynamics
CVD
electrochromic
electrochromism
field emission
hybrid CVD
low pressure CVD
performance optimization
perovskite photovoltaic materials
perovskite photovoltaic nanomaterials
pp-MOCVD
process-induced nanostructures
processing parameters
pulsed CVD
residual gas adsorption
residual gas desorption
solar cells
spray pyrolysis
stabilization
structural design
thin film
TiO2
V2O5
vanadium pentoxide
VO2
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