Etching Characteristics and Changes in Surface Properties of IGZO Thin Films by O₂ Addition in CF₄/Ar Plasma

by Chea-Young Lee, Young-Hee Joo, Minsoo P. Kim, Doo-Seung Um, Chang-Il Kim
Published 2021-07-01

Work Function Tuning of Zinc–Tin Oxide Thin Films Using High-Density O₂ Plasma Treatment

by Young-Hee Joo, Jae-Hyung Wi, Woo-Jung Lee, Yong-Duck Chung, Dae-Hyung Cho, Saewon Kang, Doo-Seung Um, Chang-Il Kim
Published 2020-10-01