Nanocrystalline-Si-dot multi-layers fabrication by chemical vapor deposition with H-plasma surface treatment and evaluation of structure and quantum confinement effects

by Daisuke Kosemura, Yuki Mizukami, Munehisa Takei, Yohichiroh Numasawa, Yoshio Ohshita, Atsushi Ogura
Published 2014-01-01