Rapid wafer-scale fabrication with layer-by-layer thickness control of atomically thin MoS2 films using gas-phase chemical vapor deposition

by Nitin Babu Shinde, Bellarmine Francis, M. S. Ramachandra Rao, Beo Deul Ryu, S. Chandramohan, Senthil Kumar Eswaran
Published 2019-08-01