THE EFFECT OF PRESSURE, BIAS VOLTAGE AND ANNEALING TEMPERATURE ON N₂ AND N₂+SiH₄ DOPED WC/C DC MAGNETRON SPUTTERED LAYERS

by Peter Hornak, Daniel Kottfer, Kaczmarek Lukasz, Kianicova Marta, Balko Jan, Rehak Frantisek, Pekarcikova Miriam, Ciznar Peter
Published 2017-12-01