Transport of F- ions in gaseous environment for technological applications

by Jovanović Jasmina V., Raspopović Zoran M., Stojanović Vladimir D., Nikitović Željka D.
Published 2013-01-01

Modeling of the effect of radicals on plasmas used for etching in microelectronics

by Nikitović Željka D., Jovanović Jasmina V., Cvelbar Uroš, Mozetič Miran, Stojanović Vladimir D.
Published 2016-01-01

Role of pressure in transport of F- ions in BF3 gas for technological applications

by Raspopović Zoran M., Stojanović Vladimir D., Cvelbar Uroš, Nikitović Željka D., Jovanović Jasmina V.
Published 2015-01-01