Probing Collisional Plasmas with MCRS: Opportunities and Challenges

by Bart Platier, Tim Staps, Peter Koelman, Marc van der Schans, Job Beckers, Wilbert IJzerman
Published 2020-06-01

EUV-Induced Plasma: A Peculiar Phenomenon of a Modern Lithographic Technology

by Job Beckers, Tijn van de Ven, Ruud van der Horst, Dmitry Astakhov, Vadim Banine
Published 2019-07-01