Polymethyl methacrylate/hydrogen silsesquioxane bilayer resist electron beam lithography process for etching 25 nm wide magnetic wires

by Currivan, Jean Anne, Siddiqui, Saima Afroz, Ahn, Sung-Min, Tryputen, Larysa, Beach, Geoffrey Stephen, Baldo, Marc A., Ross, Caroline A.
Published 2014

360° domain walls: stability, magnetic field and electric current effects

by Zhang, Jinshuo, Siddiqui, Saima Afroz, Ho, Pin, Currivan, Jean Anne, Lage, Enno, Bono, David C, Baldo, Marc A, Ross, Caroline A.
Published 2016