Physical Properties of Fe₃Si Films Coated through Facing Targets Sputtering after Microwave Plasma Treatment

by Nattakorn Borwornpornmetee, Peerasil Charoenyuenyao, Rawiwan Chaleawpong, Boonchoat Paosawatyanyong, Rungrueang Phatthanakun, Phongsaphak Sittimart, Kazuki Aramaki, Takeru Hamasaki, Tsuyoshi Yoshitake, Nathaporn Promros
Published 2021-08-01