Author Search Results

Akira Toriumi

Akira Toriumi is an engineer at the University of Tokyo, Japan. He was named a Fellow of the Institute of Electrical and Electronics Engineers (IEEE) in 2016 for his contributions to device physics and materials engineering for advanced CMOS technology. Provided by Wikipedia

1

Stepwise internal potential jumps caused by multiple-domain polarization flips in metal/ferroelectric/metal/paraelectric/metal stack

by Xiuyan Li, Akira Toriumi
Published 2020-04-01

Get full text

Article
2

Experimental evidence of zone-center optical phonon softening by accumulating holes in thin Ge

by Shoichi Kabuyanagi, Tomonori Nishimura, Takeaki Yajima, Akira Toriumi
Published 2016-01-01

Get full text

Article
3

Almost pinning-free bismuth/Ge and /Si interfaces

by Tomonori Nishimura, Xuan Luo, Soshi Matsumoto, Takeaki Yajima, Akira Toriumi
Published 2019-09-01

Get full text

Article
4

Rigidity Enhancement of GeO<sub>2</sub> by Y-Doping for Reliable Ge Gate Stacks

by Tomonori Nishimura, Xiaoyu Tang, Cimang Lu, Takeaki Yajima, Akira Toriumi
Published 2018-01-01

Get full text

Article

Cannot write session to /tmp/vufind_sessions/sess_l1l17248l6ki3l02m65h3c1ru7