Suggested Topics within your search.
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Photoresists
7
Laser beams
3
Gray scale
2
Microstructure
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3D microstructures
1
Acrylics
1
Aqua Regia
1
Aqua regia
1
Bacteria
1
Beam system
1
Blood
1
Contact position
1
Contrast curve
1
Curve fitting
1
Curve shape
1
Cutting edges
1
Differential scanning calorimetry
1
Diffraction
1
Diffraction intensity
1
Diffusion
1
Direct write lithography
1
Direct-write lithography
1
Electrodes
1
Electromotive force
1
Emulsification
1
Expensive equipments
1
Exposure correction
1
Fabrication
1
Feature sizes
1
Figure of merit
1
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1“... in the manufacture process of photoresist have been investigated. The components were studied and analyzed by burning...”
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2“...碩士 === 國立成功大學 === 化學工程學系 === 88 === Dry film photoresist is a kind of negative photoresist...”
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3“... program that can calculate the latent image in the photoresist and the profile...”
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4“... photoresist(CAMP) designed for 193 nm microlithography. The CAMP is composed of a photoacid generator(TPS...”
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6“...碩士 === 萬能科技大學 === 工程科技研究所 === 98 === In this paper,we make holographic photoresist grating base...”
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7by Chao, Adam (Adam C.)“... bibliographical references (leaf 26). === In this series of experiments, we add salt to a photoresist developer...”
Published 2009
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8by S. Yang, Bayanheshig, X. L. Zhao, S. Xing, Y. X. Jiang, N. Wu, Q. B. Jiao, W. H. Li, X. Tan“...A thickness distribution model of photoresist spin-coating on concave spherical substrate (CSS) has...”
Published 2015-07-01
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9by Vitor Vlnieska, Andrey Mikhaylov, Margarita Zakharova, Eva Blasco, Danays Kunka“...One of the types of negative tone photoresists is composed of at least a catalyst, a solvent...”
Published 2019-09-01
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14“... to determine the correlation of polyimide photoresist thickn- ess versus etch depth during the etch process...”
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15“... the methods making photoresist master of each kind of embossing hologram product...”
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16“... into the photoresist to modify its properties. The modified photoresist was used to fabricate precise microlens arrays...”
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17“...碩士 === 國立交通大學 === 電子工程系 === 91 === The Study of Photoresist Removal Mechanism by Ozone...”
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18“...碩士 === 國立交通大學 === 電子工程系 === 89 === The study of photoresist removal by ozone-water...”
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19“...博士 === 國立中央大學 === 機械工程研究所 === 89 === To reduce the photoresist usage and understand the film...”
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