Showing 161 - 180 results of 1,856 for search '"photoresist"', query time: 1.00s Refine Results
  1. 161
  2. 162
    by Po-Yuan Cheng, 鄭博元
    Published 2006
    ... alicyclic groups on the photoresist, a series of acrylic polymers with pendant chiral bornyl, decahydro-2...
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  3. 163
    by Chuang, Yen, 莊嚴
    Published 1998
    ...), molar ratio 0.4 : 0.25 : 0.2 : 0.15, tetrapolymer used for resin of 193 nm photoresist...
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  4. 164
  5. 165
    by Gen-Wen Hsieh, 謝建文
    Published 2001
    ..., and which is already used in IC industries. A negative-tone photoresist named SU-8 is the most popular...
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  6. 166
    by Yang Pao Hsiang, 楊寶翔
    Published 2005
    ... properties of photoresist thin films associated with a indentation simulation by way of the finite element...
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  7. 167
    by Ya-Ying Sung, 宋雅嬴
    Published 2005
    ... of g-line (436 nm), i-line (365 nm), and ArF (193 nm) photoresists. Thermal properties and solubility...
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  8. 168
    by Tai-Yu Chen, 陳泰宇
    Published 2016
    ... level for the process by using dummy fill for positive-tone photoresist process. We used the similar...
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  9. 169
    by Ding-Ruey Guo, 郭丁瑞
    Published 2012
    ... used in manufacturing processes were investigated. Photoresist used in photolithography process shared...
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  10. 170
    ... nm–5 nm) plasma-hardened photoresist (PHPR) layers by applying O2 plasma to treat the surface...
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  11. 171
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  13. 173
    by Jeang, Hiao-Lan, 蔣曉嵐
    Published 2019
    ... difficult factor is the parameter setting value of the photoresist adhesion strength (magnification...
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  14. 174
    by Yi-Huan Chiu, 邱奕桓
    Published 2018
    ... to clarify the cause of the non-influencing factors of photoresist crack such as soft roasting temperature...
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  15. 175
    by Yan-Sheng Yang, 楊炎勝
    Published 2008
    ... consumption of positive photoresist was about 4,000 tons and that implied a market value of about NTD 2.9...
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  16. 176
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  18. 178
    by Zi-Chen Geng, Zai-Fa Zhou, Hui Dai, Qing-An Huang
    Published 2020-10-01
    ... and precision of two-dimensional microstructures of SU-8 negative thick photoresist have drawn more attention...
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