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Photoresists
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162“... alicyclic groups on the photoresist, a series of acrylic polymers with pendant chiral bornyl, decahydro-2...”
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163“...), molar ratio 0.4 : 0.25 : 0.2 : 0.15, tetrapolymer used for resin of 193 nm photoresist...”
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165“..., and which is already used in IC industries. A negative-tone photoresist named SU-8 is the most popular...”
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166“... properties of photoresist thin films associated with a indentation simulation by way of the finite element...”
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167“... of g-line (436 nm), i-line (365 nm), and ArF (193 nm) photoresists. Thermal properties and solubility...”
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168“... level for the process by using dummy fill for positive-tone photoresist process. We used the similar...”
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169“... used in manufacturing processes were investigated. Photoresist used in photolithography process shared...”
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170by Minmin Zhou, Dehui Zhang, Dakuan Zhang, Huabin Sun, Zhe Liu, Tianhong Chen, Che-Hong Liu, Xinran Wang, Zhaohui Zhong, Yi Shi“... nm–5 nm) plasma-hardened photoresist (PHPR) layers by applying O2 plasma to treat the surface...”
Published 2021-03-01
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171by ZHANG Yongping, CHENG Yue, LU Wuyue, TAN Jiahui, ZHAO Gaojie, LIU Yihong, SUN Yujun, CHEN Zhizhan, SHI Wangzhou, LI Wanrong, LU YifengSubjects: “...photoresist...”
Published 2014-04-01
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172
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173“... difficult factor is the parameter setting value of the photoresist adhesion strength (magnification...”
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174“... to clarify the cause of the non-influencing factors of photoresist crack such as soft roasting temperature...”
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175“... consumption of positive photoresist was about 4,000 tons and that implied a market value of about NTD 2.9...”
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178“... and precision of two-dimensional microstructures of SU-8 negative thick photoresist have drawn more attention...”
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180by Felix J. Brandenburg, Tomohiro Okamoto, Hiroshi Saito, Benjamin Leuschel, Olivier Soppera, Takashi YatsuiSubjects: “...organic photoresists...”
Published 2017-04-01
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