Suggested Topics within your search.
Suggested Topics within your search.
Photoresists
7
Laser beams
3
Gray scale
2
Microstructure
2
3D microstructures
1
Acrylics
1
Aqua Regia
1
Aqua regia
1
Bacteria
1
Beam system
1
Blood
1
Contact position
1
Contrast curve
1
Curve fitting
1
Curve shape
1
Cutting edges
1
Differential scanning calorimetry
1
Diffraction
1
Diffraction intensity
1
Diffusion
1
Direct write lithography
1
Direct-write lithography
1
Electrodes
1
Electromotive force
1
Emulsification
1
Expensive equipments
1
Exposure correction
1
Fabrication
1
Feature sizes
1
Figure of merit
1
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1761“... viscosity KMPR photoresists. The resulting device is a continuous-flow microfluidic mixer based...”
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1762“... of photoresists via lithography result in the nonuniformity of the current distribution, and thus...”
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1763by Yi-Ya Huang, 黃憶雅“... hided laser beam on photoresists surface. By this way, the lattice constant of circular photonic...”
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1764“... hided laser beam on photoresists surface. By this way, the lattice constant of circular photonic...”
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1765Published 2011“... of antidot lattice. Photoresistance shows clear millimeterwave-induced resistance oscillations (MIRO...”
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1766by Cantillon-Murphy, Pádraig J“... overcomes this problem. This method uses a photoresistive scaffold and subsequent metallization to realize...”
Published 2006
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1767“... photoresistance of CD2 and CD11a antigens to UV irradiation was established at the doses range of 151 to 906 J/m2...”
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1768“... electroplating. The microstructure cavities made of positive photoresists by microlithography process and use...”
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1769“... in the photoresists. （3）The development of new photoacid reagent base on iodobenzene and polystyrene,and we identified...”
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1770“... and UV photoresists. We discuss the process conditions of temperature, pressure, and time. We also use...”
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1771“... these processes. We found that the patterning process using conventional photoresists was not suitable...”
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1772“... is to apply to the preparation of photoresists. The monomers were characterized by FT-IR，1H-NMR，13C...”
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1773“... including photoresists, Alignment Material and cleaning solvent, are still unknown because of commercial...”
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1774“... were grafted from silicon substrates with VLSI processes. First at all, photoresists were patterned...”
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1775“... NXE3400) can reach below 32 nm pitch, stochastics in the EUV absorption in photoresists has limited...”
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1776by Ryung Il Kim, Ju Ho Shin, Jong Suk Lee, Jung-Hyun Lee, Albert S. Lee, Seung Sang Hwang“... as photosensitive polyimide negative photoresists for a myriad of semiconductor patterning processes....”
Published 2020-05-01
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1777“.... Some photoresistances are adopted to judge the bulb’s conditions in the switch counter unit...”
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1778“... was to spin coating HMDS to wafer (solar cell), and then attached the photoresists to surface. To exposure...”
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1779by Alexey Odinokov, Alexander Yakubovich, Won-Joon Son, Yongsik Jung, Hyeonho Choi“... packing, material morphology of organometallic photoresists. The presented methodology is fast, accurate...”
Published 2021-09-01
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1780“... is firstly to simulate the light-intensity distribution on the photoresists surface after the lights passed...”
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