Suggested Topics within your search.
Suggested Topics within your search.
Photoresists
7
Laser beams
3
Gray scale
2
Microstructure
2
3D microstructures
1
Acrylics
1
Aqua Regia
1
Aqua regia
1
Bacteria
1
Beam system
1
Blood
1
Contact position
1
Contrast curve
1
Curve fitting
1
Curve shape
1
Cutting edges
1
Differential scanning calorimetry
1
Diffraction
1
Diffraction intensity
1
Diffusion
1
Direct write lithography
1
Direct-write lithography
1
Electrodes
1
Electromotive force
1
Emulsification
1
Expensive equipments
1
Exposure correction
1
Fabrication
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Feature sizes
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Figure of merit
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1721by Coltro, Wendell Karlos Tomazelli“... for this purpose. In this process it was used the SU-8 negative photoresist and microdevices with 1-cm2 area were...”
Published 2004
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1722Published 2003“... photoresist --- p.29 === Chapter 4.1.1.2 --- Methods for alignment --- p.31 === Chapter 4.1.2 --- Lift off...”
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1724by Awwad, Yousef Ahmad“... high resolution printer. A master of the design is then created using an SU-8 photoresist and UV light...”
Published 2014
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1725by Fouet, Marc“... to an original dry film photoresist stacking (lamination) technique, dramatically reducing micro-fabrication time...”
Published 2016
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1726“..., a convenient method of selective oxidation using photoresist or metal as masks has been realized...”
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1727by Wendell Karlos Tomazelli Coltro“... for this purpose. In this process it was used the SU-8 negative photoresist and microdevices with 1-cm2 area were...”
Published 2004
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1728by Nobre, Francisco Diego Martins“... executed using Ar/SF6 mixtures in order to obtain high etching rates. Finally, photoresist masks were...”
Published 2009
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1729by Victor Inacio de Oliveira“... was the SU-8 photoresist and the other an acrylic adhesive, an unconventional material for the production...”
Published 2014
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1730“... and Y. Whulanza, examines the application of dry film photoresist on printed circuit board (PCB...”
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1731by Schneider, Mareike“... application of the adhesion promoter which was realised either by a photoresist lacquer mask or by micro...”
Published 2002
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Doctoral Thesis -
1732by Yao, Weifang“... microscopic photographs of photoresist pattern was developed, to check if the undercut size is large enough...”
Published 2013
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1733“...) has become important because an increase of focus margin can be obtained as the photoresist...”
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1734by Silva, Janaína da Conceição Braga“... and depth of 440 µm) on two plates of Urethane- Acrylate (UA) photoresist and a polytetrafluoroethylene...”
Published 2013
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1735by Carvalho, Edson Jose de“... fringes, the photoresist relief profile was simulated in order to study the influence of some exposure...”
Published 2008
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1736by Safavieh, Hosseinali“... of a negative tone epoxy based photoresist, SU-8. These pins are inexpensive, easy to fabricate...”
Published 2014
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1737by Singh, Nagendra Pratap“..., photoresist spin coating, pre-baking, post-baking, pattern writing, developing, sputtering/deposition...”
Published 2017
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1738“... patterned photoresist mask. Note that the 20-μm-wide intra-cutting ways are designed to have...”
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1739by Bednarska, Aleksandra“...). Functionalization of photoresist polymer SU-8 concerned two methods: covalent (bio)molecule grafting and non...”
Published 2015
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1740by Brihoum, Mélissa“... etching. HBr cure is an essential pre-treatment of the 193 nm photoresist to decrease the Line Width...”
Published 2013
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