Showing 1,701 - 1,720 results of 1,856 for search '"photoresist"', query time: 1.13s Refine Results
  1. 1701
    ... annealing of a photoresist inside a TEM. HRTEM, selected area electron diffraction (SAED) and electron...
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  2. 1702
    by Lin, Jeffrey Chun-Hui
    Published 2012
    ... are achieved in this thesis by: 1) slanted photoresist generated by gray-scale photolithography, 2) pop-up...
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  3. 1703
    by Salamon, Natalia
    Published 2018
    ... technique with the use of SU-8 photoresist as an intermediate layer. Additionally, during the practical work...
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  4. 1704
    by PO-TSUN LIU, 劉柏村
    Published 2000
    ... photoresist stripping. This instability is one of the major problems in using MSQ as a low-k material...
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  5. 1705
    by Chi-Chun Chen, 陳啟群
    Published 2000
    ... is investigated and analyzed by subjecting antenna devices to a photoresist ashing step after metal pad definition...
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  6. 1706
    by Chih-jen Liu, 劉智仁
    Published 2009
    ... of chemically amplified photoresist, upon irradiation at 13.5-nm (91.84eV). The 13.5-nm light soure...
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  7. 1707
    by Chia-Hung Hou, 侯佳宏
    Published 2010
    ... structure was first formed on the photoresist via the focusing property of the microspheres...
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  8. 1708
    by Ting-Wei Lee, 李庭維
    Published 2016
    ... particles. Four photoresist pillars were made on the silicon superstrate to control the gap size between...
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  9. 1709
    by Ramos, Antonio Celso Saragossa
    Published 1993
    .... This relatively low frequency was adapted because lt a) produces a higher etch rate of Tungsten and Photoresist, b...
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  10. 1710
    by Carvalho, Edson Jose de
    Published 2003
    ... diffraction gratings. The microlenses arrays were recorded in photoresist by using photolithographic...
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  11. 1711
    by Andrew, Trisha Lionel
    Published 2011
    ... of thermally-stable photochromic molecules above the photoresist. Simultaneous irradiation of a second...
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  12. 1712
  13. 1713
    by Goswami, Ankur
    Published 2017
    ... been added to form Ti photoresist which is coated on top of the bare silicon substrate by spin coating...
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  14. 1714
    by Au, Thi Huong
    Published 2019
    ... properties of the QDs. By incorporating the QDs into a photoresist (SU-8), we demonstrated that the polymeric...
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  15. 1715
  16. 1716
    by Valtemar Fernandes Cardoso
    Published 2014
    ... with the photoresist SU-8 and the window of active area were made directly on the FR-4 and LTCC substrates. Both...
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  17. 1717
    by Fradet, Mathieu
    Published 2015
    ... changes in the process dynamics, including the complete removal of the photoresist due to process drifts...
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  18. 1718
    by Simiz, Jean-Gabriel
    Published 2016
    ...: focus. It is directly linked to the quality of the image transferred into the photoresist during...
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  19. 1719
    by Nunes, Alcinei Moura
    Published 2012
    ... and gas mixtures SF6/Ar with bias for channel etching and O2/Ar for photoresist removal were used; Ni-P...
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  20. 1720
    by Oliveira, Victor Inacio de
    Published 2014
    ... was the SU-8 photoresist and the other an acrylic adhesive, an unconventional material for the production...
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