Suggested Topics within your search.
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Photoresists
7
Laser beams
3
Gray scale
2
Microstructure
2
3D microstructures
1
Acrylics
1
Aqua Regia
1
Aqua regia
1
Bacteria
1
Beam system
1
Blood
1
Contact position
1
Contrast curve
1
Curve fitting
1
Curve shape
1
Cutting edges
1
Differential scanning calorimetry
1
Diffraction
1
Diffraction intensity
1
Diffusion
1
Direct write lithography
1
Direct-write lithography
1
Electrodes
1
Electromotive force
1
Emulsification
1
Expensive equipments
1
Exposure correction
1
Fabrication
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Feature sizes
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Figure of merit
1
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1601“.... Microstructure template was fabricated by SU-8 photoresist and lithography process. Polydimethylsiloxane (PDMS...”
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1602“... the amount of reactive monomers and dispersant can be reduced, but also the formation of the photoresist...”
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1603“... the photosensitive polymer films becoming the most common application of photoresist to be used for printed circuit...”
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1604“... utilizing the combination of AZ4620 positive photoresist (PR) and SU-8 negative PR as the electroplating...”
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1605Fabrication and Analysis of Amorphous In-Ga-Zn-O Thin-Film Transistors with Film-Profile-Engineering“... further shrunk the channel length of the FPE devices down to sub-100 nm by incorporating photoresist...”
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1606by Petruczok, Christy D. (Christy Danielle)“... developing solvent. The resolution and sensitivity of this iCVD-based negative photoresist were comparable...”
Published 2014
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1607by Park, Edward S., 1974-“... microfluidic channel and electroplating molds in a single layer of SU-8 photoresist on a glass substrate...”
Published 2006
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1608by Song, Bowen“... for the definition of the nano-pattern consists of coating the sapphire substrate with photoresist (PMMA) followed...”
Published 2017
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1609by Erieta Katerina Koussi, Hugo Bruhier, M. A. Usuga Higuita, Isabelle Verrier, Colette Veillas, Thomas Kampfe, Stephanie Reynaud, Nicolas Crespo-Monteiro, Olivier Parriaux, Yves Jourlin“... grating phase-mask transverse to the tube axis under axial beam exposure onto a photoresist-coated TiO<sub...”
Published 2020-01-01
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1610by Pasquale, Anthony J.“... to increase as the content of NbTBE was increased. 193 nm photoresist formulations incorporating polymers...”
Published 2014
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1611by You, Eunyoung“... by sequentially performing nanoimprint lithography (NIL) and SFD. NIL was used to pattern photoresist grating...”
Published 2012
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1614by Emil Ludvigsen, Nina Ritter Pedersen, Xiaolong Zhu, Rodolphe Marie, David M. A. Mackenzie, Jenny Emnéus, Dirch Hjorth Petersen, Anders Kristensen, Stephan Sylvest Keller“...-8 photoresist by irradiation with a low-power, 806 nm, continuous wave, semiconductor-diode laser...”
Published 2021-05-01
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1615“.... The manufacturing process first uses photolithography to expose photoresist on the thin film into porous electrode...”
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1616“... of inorganic SiOxNy film deposited in patterned photoresist structure and the silicon substrate silicone...”
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1617by Darmakkolla, Srikar Rao“... an acetone wash removed loosely bound NWs on the photoresist surface. In electrical characterization...”
Published 2017
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1618“... as the photoresist stripper in TLC-LCD manufacturing industry. It is proven that DMSO is very difficult...”
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1619“.../fmax ratio. A tri-layer photoresist of ZEP-A7/LOR/ZEP-A7 is developed to obtain high profile T-gates...”
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1620“... HN-008N photoresist dielectric layer and screen-printing Teflon AF1600X (AFX) hydrophobic top-layer...”
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