Showing 1,601 - 1,620 results of 1,856 for search '"photoresist"', query time: 0.74s Refine Results
  1. 1601
    by De-Xiong Wang, 王德雄
    Published 2012
    .... Microstructure template was fabricated by SU-8 photoresist and lithography process. Polydimethylsiloxane (PDMS...
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  2. 1602
    by Chien-Hsun Chen, 陳建勳
    Published 2012
    ... the amount of reactive monomers and dispersant can be reduced, but also the formation of the photoresist...
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  3. 1603
    by Yen-Rung Jhu, 朱彥蓉
    Published 2017
    ... the photosensitive polymer films becoming the most common application of photoresist to be used for printed circuit...
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  4. 1604
    by Pi-Shun Chen, 陳必軒
    Published 2014
    ... utilizing the combination of AZ4620 positive photoresist (PR) and SU-8 negative PR as the electroplating...
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  5. 1605
    by Shie, Bo-Shiuan, 謝博璿
    Published 2016
    ... further shrunk the channel length of the FPE devices down to sub-100 nm by incorporating photoresist...
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  6. 1606
    ... developing solvent. The resolution and sensitivity of this iCVD-based negative photoresist were comparable...
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  7. 1607
    by Park, Edward S., 1974-
    Published 2006
    ... microfluidic channel and electroplating molds in a single layer of SU-8 photoresist on a glass substrate...
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  8. 1608
    by Song, Bowen
    Published 2017
    ... for the definition of the nano-pattern consists of coating the sapphire substrate with photoresist (PMMA) followed...
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  9. 1609
  10. 1610
    by Pasquale, Anthony J.
    Published 2014
    ... to increase as the content of NbTBE was increased. 193 nm photoresist formulations incorporating polymers...
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  11. 1611
    by You, Eunyoung
    Published 2012
    ... by sequentially performing nanoimprint lithography (NIL) and SFD. NIL was used to pattern photoresist grating...
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  12. 1612
  13. 1613
  14. 1614
  15. 1615
    by I-Hung Wei, 魏義鴻
    Published 2008
    .... The manufacturing process first uses photolithography to expose photoresist on the thin film into porous electrode...
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  16. 1616
    by Shao-Kai Lu, 呂紹楷
    Published 2015
    ... of inorganic SiOxNy film deposited in patterned photoresist structure and the silicon substrate silicone...
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  17. 1617
    by Darmakkolla, Srikar Rao
    Published 2017
    ... an acetone wash removed loosely bound NWs on the photoresist surface. In electrical characterization...
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  18. 1618
    by Chih-Chun Lin, 林志忠
    Published 2009
    ... as the photoresist stripper in TLC-LCD manufacturing industry. It is proven that DMSO is very difficult...
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  19. 1619
    by En-Shuo Lin, 林恩碩
    Published 2018
    .../fmax ratio. A tri-layer photoresist of ZEP-A7/LOR/ZEP-A7 is developed to obtain high profile T-gates...
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  20. 1620
    ... HN-008N photoresist dielectric layer and screen-printing Teflon AF1600X (AFX) hydrophobic top-layer...
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