Suggested Topics within your search.
Suggested Topics within your search.
Photoresists
7
Laser beams
3
Gray scale
2
Microstructure
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3D microstructures
1
Acrylics
1
Aqua Regia
1
Aqua regia
1
Bacteria
1
Beam system
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Blood
1
Contact position
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Contrast curve
1
Curve fitting
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Curve shape
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Cutting edges
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Differential scanning calorimetry
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Diffraction
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Diffraction intensity
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Diffusion
1
Direct write lithography
1
Direct-write lithography
1
Electrodes
1
Electromotive force
1
Emulsification
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Expensive equipments
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Exposure correction
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Fabrication
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Feature sizes
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Figure of merit
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1581by Ayenew, Getachew Tilahum“... photomask made of self organized micro nanoparticles, and a conventional photoresist. The mask consists...”
Published 2014
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1582“... of other items was also improved. In the fourth part, negative transparent photoresist was used...”
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1583“... of DNA was improved by ultrasonic cleaning photoresist and changing the timing of oxygen plasma treatment...”
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1584“... was increased, the resin was incompatible with the organic material. Hence, a negative transparent photoresist...”
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1585“... holes by Nd:YVO4 laser. The epoxy substrate was passivated by photoresist to make openings...”
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1586by Changwen Su, Yue Lin, Tien-Mo Shih, Hao Lu, Yang Gao, Jia-En Huang, Yi-Jun Lu, Tingzhu Wu, Zhong Chen, Weijie Guo“... of photoresist development under different design widths as well as development time, establish mathematical...”
Published 2020-07-01
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1587by Sagar Singh, Meng-Chen Lo, Vinod B. Damodaran, Hilton M. Kaplan, Joachim Kohn, Jeffrey D. Zahn, David I. Shreiber“... and coated SU-8 photoresist and Parylene C probes. Model predictions were found to strongly agree...”
Published 2016-03-01
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1588by Smith, Elliot John“... based on the roll-up from semiconductor material or from a photoresist layer. A new approach, relying...”
Published 2011
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Doctoral Thesis -
1589by Prabhakar, Aparna“... LIGA (Lithographie, Galvanoformung and Abformung) technique wherein a patterned positive photoresist...”
Published 2006
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1590by Upadhyaya, Kailash“... photoresist and anodically bonded silicon (mask 3). Etch depths greater than 600 µm in glass has been achieved...”
Published 2005
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1591by Miao, Zhengyu“... parameters on the final surface profiles of microlenses were thoroughly analyzed and discussed. A photoresist...”
Published 2013
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1592“... to peel off graphene from Pt foil samples with the mechanical support of photoresist and further...”
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1593by del Tin, Laura <1979>“... different conductive layers for the definition of the actuation electrodes and by the use of a photoresist...”
Published 2007
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Doctoral Thesis -
1594“... of transmittance control mask (TCM). As the line widths get narrower, in order to avoid the photoresist bridging...”
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1595“... or photoresist residue. Although the quality still needs to be improved, using oil vapor as carbon source...”
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1596“... utilize the 3.5μm thickness of TiOPc as photosensitive layer, 1.2μm thickness of positive photoresist...”
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1597“... beamsplitter on the substrate coated with photoresist. To obtain uniform exposure dose distribution over...”
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1598“... photoresist ash, the plasmolyzed gases not only can’t release charges on dummy metal surfaces, but also even...”
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1599“..., mechanism illustrating sloped sidewall of Cu deposit adjacent to photoresist mask during electrodeposition...”
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1600“...) For mask change, we have two way, first is reverse tone, we use the photoresist that has similar index...”
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