Suggested Topics within your search.
Suggested Topics within your search.
Photoresists
7
Laser beams
3
Gray scale
2
Microstructure
2
3D microstructures
1
Acrylics
1
Aqua Regia
1
Aqua regia
1
Bacteria
1
Beam system
1
Blood
1
Contact position
1
Contrast curve
1
Curve fitting
1
Curve shape
1
Cutting edges
1
Differential scanning calorimetry
1
Diffraction
1
Diffraction intensity
1
Diffusion
1
Direct write lithography
1
Direct-write lithography
1
Electrodes
1
Electromotive force
1
Emulsification
1
Expensive equipments
1
Exposure correction
1
Fabrication
1
Feature sizes
1
Figure of merit
1
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1401“... ingredient of photoresist developer in light emitting diode (LED) production, as well as an alkaline etchant...”
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1402“... in the electroless plating process. The existence of photoresist passivation was confirmed to be necessary in order...”
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1403by Ng, Jack Hoy-Gig“... that eliminates metal evaporation and/or photoresist molding procedures. The process design is chosen from...”
Published 2013
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1404“... the steps of RCA Clean, photoresist coating, exposure and development, Finally, the photo current and dark...”
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1405“... imprinting. By means of spin-coating by reversal imprinting technique, epoxy resin and photoresist fills...”
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1406by Dimitrakopoulos, Nikolaos“... is a negative tone photoresist has been extensively used in this project. .,- Firstly by using standard...”
Published 2007
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1407“... 20.78%). The second section of the experiments. We spinned coating photoresist on FTO surface...”
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1408“.... (1) The active area of OLED is defined by photoresist, (2) and etching ITO electrode to micron size...”
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1409by Charters, R. B.“... of photoresist films produces solid state devices with 3dB linewidths as narrow as 7.0nm and insertion losses...”
Published 1995
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1410“... were measured. The results show the TE wave coupling efficiency of the photoresist grating coupling...”
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1411by Treger, Mikhail A.“... or the photoresist masking of substrate stresses revealed a significant change to the recrystallization kinetics...”
Published 2015
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1412by Al-Abdullah, Zainab Taha Yassin“... positive photoresist. Instead of circular nanotubes, polygonal TiO2 nanotubes were formed from...”
Published 2013
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1413“.... Usually, the removal of photoresist in lithography process will damage the underlying organic...”
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1414“... photoresist thickness needs to have longer development times. The optimum condition is 8~10 second to exposure...”
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1415by Elias Torres Alonso, Daniela P. Rodrigues, Mukond Khetani, Dong-Wook Shin, Adolfo De Sanctis, Hugo Joulie, Isabel de Schrijver, Anna Baldycheva, Helena Alves, Ana I. S. Neves, Saverio Russo, Monica F. Craciun“... fibres via a sacrificial photoresist layer. This creates a versatile platform for efficient device...”
Published 2018-09-01
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1416by R. Morarescu, P. K. Pal, N. T. Beneitez, J. Missinne, G. V. Steenberge, P. Bienstman, G. Morthier“...) nanoimprint lithography. In a first step, a negative photoresist (SU8-2) patterned by photolithography...”
Published 2016-01-01
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1417by Feng, Ru“.... In the second project, a new epoxy based negative photoresist, SU8, was investigated. The influence of three...”
Published 2002
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1418by Zando, Robert“...-sensitive, negative-tone photoresist material, a grating was patterned onto a glass substrate via...”
Published 2016
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1419by Daga, Vikram Kumar“... of additives into photoresists for next generation extreme ultra violet (EUV) photolithography applications...”
Published 2011
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