Suggested Topics within your search.
Suggested Topics within your search.
Photoresists
7
Laser beams
3
Gray scale
2
Microstructure
2
3D microstructures
1
Acrylics
1
Aqua Regia
1
Aqua regia
1
Bacteria
1
Beam system
1
Blood
1
Contact position
1
Contrast curve
1
Curve fitting
1
Curve shape
1
Cutting edges
1
Differential scanning calorimetry
1
Diffraction
1
Diffraction intensity
1
Diffusion
1
Direct write lithography
1
Direct-write lithography
1
Electrodes
1
Electromotive force
1
Emulsification
1
Expensive equipments
1
Exposure correction
1
Fabrication
1
Feature sizes
1
Figure of merit
1
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1381“... on glass substrate by using MEMS technology. Electroplating process and thick photoresist technology were...”
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1382by Yang, Jilin“... photoresist. At last, the developed and proposed process provides means of all-polymer based fabrication...”
Published 2015
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1383“... photoresist coating, exposure, and development processes, is key processes of producing TFT-LCD array. When a...”
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1384“... the IER structure. The substrate was chosen glass spun coating with photoresist AZ P4620. After properly...”
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1385“...-sensing membrane. We used SU-8 as a photoresist to define the different size Sensing areas. In the first...”
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1386“...、anisotropic、surface morphologies, and the photoresist effect. （2）Using Cl2/BCl3/N2/H2/HBr/Ar...”
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1387“... photoresist to be form the shape of micro-channel. The melted PDMS is then poured into the mold, followed...”
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1388“... had been measured. These films could reduce the back reflection from the interfaces of photoresist...”
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1389“... nanoparticles and commercially available negative photoresist (SU-8) sequentially on a flexible PI substrate, a...”
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1390“... by focused ion beam (FIB) milling. The other one is the Fresnel microlens in positive photoresist AZ4620...”
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1391by Sheng-Siang Huang, 黃勝祥“... device damage and influence the etching rate and residual photoresist removal. So, it is important...”
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1392“... machine has photoresist and mask process constraint by itself. We study how to allocate...”
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1393“... might be degraded after the photoresist removal process that commonly implemented with O2 plasma ashing...”
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1394“... speed while the scanning mechanism steers the laser beam to expose the photoresist in a...”
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1395“... geometric design parameters for fabrication. Thick photoresist, electroplating, and bulk...”
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1396“... the etching and photoresist striping processes. The part of film exposed by X-ray will be cured and the other...”
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1397“... plasma treatments to improve the dielectric properties of porous silica after photoresist removal...”
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1398“... which utilizes the thermal crack induced by immersing the bowtie-photoresist patterns into liquid...”
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1399“... photoresist stacking technique with SU-8 and etching process in Photolithography as the immuno-sensor...”
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1400“... ingredient of photoresist developer in light emitting diode (LED) production, as well as an alkaline etchant...”
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