Suggested Topics within your search.
Suggested Topics within your search.
Photoresists
7
Laser beams
3
Gray scale
2
Microstructure
2
3D microstructures
1
Acrylics
1
Aqua Regia
1
Aqua regia
1
Bacteria
1
Beam system
1
Blood
1
Contact position
1
Contrast curve
1
Curve fitting
1
Curve shape
1
Cutting edges
1
Differential scanning calorimetry
1
Diffraction
1
Diffraction intensity
1
Diffusion
1
Direct write lithography
1
Direct-write lithography
1
Electrodes
1
Electromotive force
1
Emulsification
1
Expensive equipments
1
Exposure correction
1
Fabrication
1
Feature sizes
1
Figure of merit
1
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121by 林秀芬“... photoresist pattern to electroplate copper. Photoresist is the most important material in photolithography...”
Published 2011
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122by Yu-Chia Liu, 劉又嘉“.... The second part of this study is use our equipment to etching photoresist film that coating on the wafer...”
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123“... on the filed of g-line (436 nm), i-line (365 nm), and ArF (193 nm) photoresists. The positive tone...”
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124“... to silicon substrate where ground electrode located. By the adhesion ability of photoresist AZ4620 and PDMS...”
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125
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126“... copolymers with o-nitrobenzyl bromide. Finally preformed the deep-UV photoresists ARe~FRe...”
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127“...碩士 === 國立中興大學 === 機械工程學系所 === 94 === Photoresist has been widely used for forming patterns...”
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128“... we add MAA monomer to photoresist solution and try to improve the properties of thick film...”
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129“... different photoresist (PR) remained thickness andprofile after PR development. This technique has been...”
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130“... (DMF). Finally preformed the deep-UV photoresists PRⅠ~PRⅤ. The resists, chain-stiffening...”
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131
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132“... the photoresist films were exposed to deep-UV light, absorption decreasing and resist films...”
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133“... of the negative tone photoresists comprising various molar ratios of HEMA, MMA, (-)-BMA, NB, and MAA were...”
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134“... for stripping the photoresist layer for solder balls electroplating. Mass spectrometry analysis is used...”
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135
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136“... it has been used in etch fluid monitoring and analysis in recent years. Like etchant, photoresist...”
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137“... “the photoresist of the electronic chemicals industry” to illustrate the feasibility of this DQA process and its...”
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138
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139“... of photoresist solvents were investigated. Manwhile, the breakthrough time matrix was established as a reference...”
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140“... of the positive photoresist soft baking process in Copper Pillar Bump. The experimental parameters are used...”
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