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Photoresists
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1361by Hassan, Md. Fuhad“... newer dielectric materials (Cyanoethyl Pullulan (CEP) and S1813 positive photoresist) which result in a...”
Published 2013
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1362by Hassan, Md. Fuhad“... newer dielectric materials (Cyanoethyl Pullulan (CEP) and S1813 positive photoresist) which result in a...”
Published 2013
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1363“..., negative SU-8 thick photoresist was proposed as the solder mask due to its excellent properties...”
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1364by Tasuku Nakahara, Junya Suzuki, Yuki Hosokawa, Fusao Shimokawa, Hidetoshi Kotera, Takaaki Suzuki“... microvalve array using a photosensitive composite. The composite was prepared by mixing a photoresist...”
Published 2018-01-01
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1365by Shuenn-Kung Su, Feng-Ping Lin, Chih-Feng Huang, Chien-Hsing Lu, Jem-Kun Chen“... of grating. PGMA grating grafted from a 1.5 µm resolution of trench arrays of photoresist exhibited...”
Published 2019-03-01
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1366by Hassan, Md. Fuhad“... newer dielectric materials (Cyanoethyl Pullulan (CEP) and S1813 positive photoresist) which result in a...”
Published 2013
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1367by Hassan, Md. Fuhad“... newer dielectric materials (Cyanoethyl Pullulan (CEP) and S1813 positive photoresist) which result in a...”
Published 2013
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1368“... in photoresist zone. Part two: This research is aim to develop a method of qualitative...”
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1369“... unidirectional, unimodal, continuous piezoelectric composite, consisting of SU8 photoresist as matrix...”
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1370“... controlled by the computer. The grating array designed with photoresist plate is used to control...”
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1371by 陳彥文“... the unoxidation regions by 5% HF. The titanium dioxide become the metal mask, likes the positive photoresist...”
Published 2004
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1372“... etching and LIGA-like techniques. The KMPR 1050 photoresist is chosen to achieve high aspect ratio...”
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1373“... photoresist film made by nano imprint process to become the cross stacking wire-grid polarizer. The cross...”
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1374“... the silica sphere arrays and the photoresist is a major problem. We also discover that polystyrene...”
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1375“... then measured. The microfluidic device using SU-8 photoresist as template structure, polydimethylsiloxane (PDMS...”
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1376“... on grating pattern mold, then infiltrate SU8 photoresist and etching SiO2 in order to fabricate groove on SU8...”
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1377“...)) the silicon substrate was polished by diamond paste, photoresist mixed with the diamond powder and diamond...”
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1378by 朱鴻麟“... layer of PDMS was molded by the pattern. The pattern was made from negative photoresist of SU-8, which...”
Published 2011
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1379“... are defined by electron-beam lithography. The effects of electron beam dosage on photoresist profile and metal...”
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1380“... components in the high-current thermal effect under . Instead of using SiO2, the negative photoresist SU-8...”
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