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Photoresists
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1341“... conical MNA on SU-8 photoresist through PDMS transfer technology. All three processes utilize parallel...”
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1342by Intan Sue Liana Abdul Hamid, Beh Khi Khim, Sofiyah Sal Hamid, Mohamad Faizal Abd Rahman, Asrulnizam Abd Manaf“.... Negative photoresist SU8 is used for mould realisation with structural height ranging from 163.8 to 1108.7...”
Published 2020-05-01
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1343by Akshdeep SHARMA, Deepak BANSAL, Maninder KAUR, Prem KUMAR, Dinesh KUMAR, Rina SHARMA, K. J. RANGRA“... realized by means of surface micromachining, adopting photoresist as a sacrificial layer and electroplated...”
Published 2011-12-01
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1344by Paulina Natalia Osuchowska, Przemysław Wachulak, Agata Nowak-Stępniowska, Andrzej Bartnik, Kajangi Gnanachandran, Małgorzata Lekka, Joanna Czwartos, Henryk Fiedorowicz, Elżbieta Anna Trafny“... in SXCM. The image quality depended on the soft X-ray (SXR) absorbed energy and photoresist development...”
Published 2020-10-01
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1345by Yu Min Choi, Han Young Shin, Jongchan Son, Chunhee Park, Keun-Woo Park, Jin-Kyun Lee, Byung Jun Jung“... substrate using a negative-tone highly fluorinated photoresist (PR) and fluorous solvents. Preliminary...”
Published 2020-06-01
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1346by Laurent Markey, Christian Vernoux, Kamal Hammani, Juan Arocas, Jean-Claude Weeber, Alain Dereux“... waveguides comprise a thin gold-photoresist core embedded into SU-8 claddings and show typical propagation...”
Published 2020-06-01
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1347by Jan Meyer, Antonio Nedjalkov, Christian Kelb, Gion Joel Strobel, Leonhard Ganzer, Wolfgang Schade“... of polymer Bragg gratings into waveguides of the epoxy-based negative photoresist material EpoCore for a...”
Published 2020-01-01
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1348“... negative photoresist, SU-8. One of the reasons is the high absorption rate of 365-nm ultra-violet light...”
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1349“... photoresist twice. The mask was re-oriented between exposures (90° or 45°), forming an array of dual-exposed...”
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1350“.... The diameters of the imprinted ILR-1050 photoresist nanopores are about 94.5 ± 12.2 nm and the diameters...”
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1351“... slide. A microchannel was realized by photoresist lift-off technique and a polydimethylsiloxane (PDMS...”
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1352by Suhith Hemanth, Arnab Halder, Claudia Caviglia, Qijin Chi, Stephan Sylvest Keller“... electrode was microfabricated using the pyrolysis of photoresist precursor structures, which were...”
Published 2018-07-01
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1353by Jun Kim, Dongin Hong, Mohsin Ali Badshah, Xun Lu, Young Kyu Kim, Seok-min Kim“... precursor, which was replicated from the thermal reflow photoresist master pattern. A microdome array with a...”
Published 2018-07-01
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1354“... hemi-cylindrical photoresist template. A replica mold of polydimethylsiloxane, produced by casting...”
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1355by Julieta Ledesma, Santiago A. Bortolato, Carlos E. Boschetti, Débora M. Martino“... in the fabrication of copolymer films for potential photoresist use. The PBD results assigned a maximum absorption...”
Published 2013-01-01
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1356“... by using stereolithography process with a special SU-8 photoresist and the reproducibility of the method...”
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1357by Mumm, Florian“... aligned copper oxide nanowires were integrated into photoresist microstructures made by traditional UV...”
Published 2010
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Doctoral Thesis -
1358by Hobæk, Thor Christian“... of the elastomer polydimethylsiloxane (PDMS), using a copper and/or the epoxy-based SU-8 photoresist surface as a...”
Published 2011
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1359by Luharuka, Rajesh“... by electroplating a soft magnetic material, Permalloy (Ni80Fe20) in a sacrificial photoresist mold on a Silicon...”
Published 2008
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1360by Flobak, Åsmund“... of the photoresist SU-8 and polydimethylsiloxane (PDMS).Nanowires are envisaged as one way two deliver bioactive...”
Published 2013
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