Suggested Topics within your search.
Suggested Topics within your search.
Photoresists
7
Laser beams
3
Gray scale
2
Microstructure
2
3D microstructures
1
Acrylics
1
Aqua Regia
1
Aqua regia
1
Bacteria
1
Beam system
1
Blood
1
Contact position
1
Contrast curve
1
Curve fitting
1
Curve shape
1
Cutting edges
1
Differential scanning calorimetry
1
Diffraction
1
Diffraction intensity
1
Diffusion
1
Direct write lithography
1
Direct-write lithography
1
Electrodes
1
Electromotive force
1
Emulsification
1
Expensive equipments
1
Exposure correction
1
Fabrication
1
Feature sizes
1
Figure of merit
1
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1021“... to coating photoresist twice on silicon wafer. We set up an experiment system to measure the velocity...”
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1022“.... In the fabrication of this polarization beam splitter, we use interference lithography to define photoresist pattern...”
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1023“... as the photoresist in electronics industry and it is also important reactant in other industry. First of all...”
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1024“... in this research. Three steps in this fabrication technique are included. First, using the photoresist SU-8...”
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1025“.... The photoresist mold of the slanted membrane is produced using a microfluidic photomask. The microfluidic...”
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1026“.... The wafer was then coated with another layer of photoresist to form lift-off structure. This novel process...”
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1027by 張峻銘“... to replace photoresist as mask to selectively deposit optical films by E-gun evaporation. Straight and mosaic...”
Published 2006
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1028“... sacrificial layer. The photoresist SU-8 is spin-coated on the top and exposured with linkage structure...”
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1029“... is the contact between water and photoresist. Therefore, utilizing a transparent polymer thin-film between...”
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1030“... is focused via an objective lens onto a layer of photoresist which is transparent to the operating wavelength...”
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1031“... gate. And When measuring pH value, device layer is cover by photoresist. Channel is open by aligner...”
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1032“... successfully. Second, SU-8 photoresist was coated all over the above workpiece as a structure for the circular...”
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1033“... analyzed under modification of the device process by controlled well for the thickness of photoresist...”
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1034“..., the surface of PDMS should be not only hydrophilic, but more flat so that the photoresist could be spun...”
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1035The Study of Indium Zinc Oxide Transparent Conducting Layer on Gallium Nitride Light Emitting Diodes“... photoresist and inductively coupled plasma etching to increase light extraction efficiency. Also，we used...”
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1036by 朱世欽“... photoresist to form trench structure on substrate and fabricated transistors on it.Compared with the mobility...”
Published 2011
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1037“... photopolymer as process material, same as negative photoresist material used in MEMS’s process but reduce many...”
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1038“... when it inject in the photoresist. We inference the developing rate will follow the electron energy...”
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1039“... (using photoresist), which the protected region was silicon dioxide or silicon nitride while the v-groove...”
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1040“.... Microchannels are constructed of the silicon and SU8 photoresist respectively. The widths of the microchannels...”
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