Suggested Topics within your search.
Suggested Topics within your search.
Photoresists
7
Laser beams
3
Gray scale
2
Microstructure
2
3D microstructures
1
Acrylics
1
Aqua Regia
1
Aqua regia
1
Bacteria
1
Beam system
1
Blood
1
Contact position
1
Contrast curve
1
Curve fitting
1
Curve shape
1
Cutting edges
1
Differential scanning calorimetry
1
Diffraction
1
Diffraction intensity
1
Diffusion
1
Direct write lithography
1
Direct-write lithography
1
Electrodes
1
Electromotive force
1
Emulsification
1
Expensive equipments
1
Exposure correction
1
Fabrication
1
Feature sizes
1
Figure of merit
1
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1001“... is completed by the slot coating. The goal of the research is to reduce to the photoresist and rise the yield...”
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1002by 范植鈞“... and 300 nm to perform the near-field optical writing on photoresist thin film surface. Results of optical...”
Published 2001
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1003“... and film mask on SU-8 photoresist. The result shows that the thickness of the mould could be precisely 50...”
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1004“... SU-8 negative photoresist as main structure layer material and UV adhesive FP-4272 as diaphragm...”
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1005“... used the positive photoresist AZ4620 as the sacrificial layer and wrapped it with the room-temperature...”
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1006“... the photoresist’s components. Next, we describe the different photoreducing agents and photoreactions that lead...”
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1007“... thick film photoresist on the silicon wafer is used to fabricate the structure of the micromixers...”
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1008“... as removes sacrificial layers suspension structure with CMOS MEMS post process. Finally clear photoresist...”
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1009“...nm photoresist to be our objection. Secondly, I selected high polarity alcohol solvent which is able...”
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1010“... nanoparticle and SU8-2050 epoxy-based negative photoresist. The relationship between magnetic field...”
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1011“.... In fabrication, SU-8 thick film photoresist is used to fabricate the mold of the micromixers by photolithography...”
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1012“... or using photoresist which is a relatively cumbersome process. In this study, we intended to fabricate...”
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1013“... SU-8 thick photoresist as a material for the main structure of the microgripper. The dimensions...”
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1014“... was fabricated using the micromolding of SU-8 photoresist and made of PDMS. The mixing performance has been...”
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1015“... that the Si nano-wires can provided，(2) hard membrane photoresist process which assisted in better catalytic...”
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1016“.... The AZ-type positive photoresist was used as the electroforming mould, which was patterned by UV...”
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1017by Binnie, Iona B.“... suggests that film thickness and photoresist thickness have a profound effect on linewidth dimensions...”
Published 1991
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1018“... through a deep UV lithography technique and the SU-8 photoresist was used as microstructure material...”
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1019“.... The photoresist is spun, exposed and developed on the back side. For the purpose of opening the wet etch hole...”
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1020by Yen-Chung Chen, 陳彥鐘“... was made of negative photoresist, SU8. Moreover, the ITO electrode substrate was bonded with another glass...”
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