Suggested Topics within your search.
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Photoresists
7
Laser beams
3
Gray scale
2
Microstructure
2
3D microstructures
1
Acrylics
1
Aqua Regia
1
Aqua regia
1
Bacteria
1
Beam system
1
Blood
1
Contact position
1
Contrast curve
1
Curve fitting
1
Curve shape
1
Cutting edges
1
Differential scanning calorimetry
1
Diffraction
1
Diffraction intensity
1
Diffusion
1
Direct write lithography
1
Direct-write lithography
1
Electrodes
1
Electromotive force
1
Emulsification
1
Expensive equipments
1
Exposure correction
1
Fabrication
1
Feature sizes
1
Figure of merit
1
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961“... dopant source. Futhermore, a novel process which employs the photoresist or SiO2 as a mask...”
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962“.... They are blanket deposition, selective deposition, and no deposition on the photoresist patterned...”
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963“...) and optical microscope (OM). The thickness of the EPD films， photoresist layer， and release layer were...”
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964“... compound eye fabrication. The photoresist column array fabricated by lithography and followed...”
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965“.... The second method: Dilute the photoresist with the other resists. We have demonstrated the narrow veins can...”
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966“... parameter value. Second part is the microlens mask fabrication. The photoresist (AZ-4620) column array...”
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967“... to bring in zigzag defect. In this study, the use of SU-8 photoresist to make photospacer by using...”
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968“...-8 photoresist was used in making the mold, and PDMS in replica modeling. Oxygen plasma technology...”
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969“... of the mixing efficiency of the micromixer. In fabrication, SU-8 thick film photoresist is used to fabricate...”
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970“... device was developed for tyramine analysis. SU-8 photoresist was spin-coated on the wafer, which...”
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971by 陳明煌“... photoresist profile either optical microscope or the cross section of SEM image were almost the same. Micro...”
Published 2016
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972“... desktop laser printer while the toner acts as the photoresist. The electrodes are deposited with spray...”
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974
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975“... (negative) or AZ-4620 (positive) photoresist, are in very good agreement with the theoretical predictions...”
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976“... process, photoresist layers (AZ-1518) of different thicknesses (1.6 and 1.9 μm) were used as a mask...”
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977“.... In this study, soda-lime glass and SU-8 negative photoresist have been examined for the fabrication...”
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978“... to form composite photoresist solution followed by spin coating, and soft baking for exposing...”
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979by Rigon, Elso Luiz“.... The experimental conditions for recording photoresist masks are described, as well as for the lithography...”
Published 2003
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980“... is studied to solve Oxygen analyzer sampling tube blocking problem. The solvent in the photoresist material...”
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