Showing 901 - 920 results of 1,856 for search '"photoresist"', query time: 0.51s Refine Results
  1. 901
    by Yi-TingTsai, 蔡易庭
    Published 2014
    ... of the silicon wafer, and next, coating photoresist on top. After exposure and development, the pattern of flow...
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  2. 902
    by Yu-Fu Chen, 陳昱甫
    Published 2012
    ..., micro molding process and applying electric field method. First, the negative photoresist SU-8 is used...
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  3. 903
    by Jyun-De Wu, 吳俊德
    Published 2017
    ... of photoresist film. This sample configuration is ideal for the following angled metal or dielectric material...
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  4. 904
    by Ching-Chang Liu, 劉慶昌
    Published 2019
    ..., the Line defect is related to ITO terminal breaking. For instants, dry process gas etch photoresist...
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  5. 905
    by Ming-Fung Shie, 謝明峰
    Published 2010
    ... negative tone photoresist and subsequently transferred to a PDMS mold; following this step, the PDMS...
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  6. 906
    by Scott, Kevin
    Published 2014
    ... Nabity NPGS lithography conversion kit. PMMA of 950kDa molecular weight was used as the photoresist...
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  7. 907
    by HUA-HSIU HU, 胡華秀
    Published 2019
    ... photoresist and generate colored wastewater. Removal of color by sodium hypochlorite (NaOCl) is popular...
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  8. 908
    by Chi-Hsing Lin, 林其興
    Published 2008
    ... photolithography with thick film photoresist. In this experiment, the waveguides thickness were controlled...
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  9. 909
    by Chin Chia Chang, 張晉嘉
    Published 2014
    ... 250nm. We used dry etching technique to remove the unnecessary photoresist. After the process of dry...
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  10. 910
    by Hsu, Wen-Hsien, 徐文賢
    Published 2018
    ... sputter nickel and amorphous silicon on photoresist coated Si(100) substrate, and use acetone to lift off...
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  11. 911
    by Lin, Chang-Wei, 林長威
    Published 2019
    ..., photoresist transfer and chemical etching. Our experiment uses laser engraving to penetrate the 0.1 mm acrylic...
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  12. 912
    by Shao-Yi Li, 李紹義
    Published 2007
    ...-process of CMOS to form the structures. Finally, use a thick layer photoresist to complete the packaging...
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  13. 913
    by Yu Nong Chen, 陳雨農
    Published 2016
    ... the photoresist SU-8 have several unique features including excellent imaging sensitivity, high aspect ratios...
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  14. 914
    by LIN, TSUNG-WEI, 林琮偉
    Published 2018
    ... using a thick photoresist layer. 3DMM has silver walls with a high aspect ratio. Therefore, 3DMM...
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  15. 915
    ... of SXR sensitive photoresist. Applications of such desk-top EUV and SXR microscopes, mostly...
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  16. 916
    .... The arrays were created via a layer of photoresist patterned with grids of apertures using electron beam...
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  17. 917
    ...SU-8 epoxy-based negative photoresist has been extensively employed as a structural material...
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  18. 918
    by Weiping Zhang, Xiaosheng Wu, Wenyuan Chen, Wu Liu, Feng Cui
    Published 2011-11-01
    ... about 500 μm using UV-LIGA by successful removal of SU-8 photoresist mold, DRIE of silicon proof mass...
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  19. 919
    by Mason, Ashley D.
    Published 2011
    ... carbonized photoresist (C-PR) as a nucleation layer. The use of C-PR allows simultaneous growth...
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  20. 920
    by Xing, Xiao
    Published 2010
    ... surfaces (pyrolyzed photoresist films, PPFs) sequentially through two independent approaches. The first...
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