Suggested Topics within your search.
Suggested Topics within your search.
Photoresists
7
Laser beams
3
Gray scale
2
Microstructure
2
3D microstructures
1
Acrylics
1
Aqua Regia
1
Aqua regia
1
Bacteria
1
Beam system
1
Blood
1
Contact position
1
Contrast curve
1
Curve fitting
1
Curve shape
1
Cutting edges
1
Differential scanning calorimetry
1
Diffraction
1
Diffraction intensity
1
Diffusion
1
Direct write lithography
1
Direct-write lithography
1
Electrodes
1
Electromotive force
1
Emulsification
1
Expensive equipments
1
Exposure correction
1
Fabrication
1
Feature sizes
1
Figure of merit
1
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861“... transfer the miniature patterns into the uv-curable PAK-01 photoresist on PES plastic substrates under...”
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862“... on different development properties of the positive and negative photoresists. The feature size of filtration...”
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863“... in the microelectronics industry to form a thin uniform film of photoresist or polyomide...”
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864“... result, the process has to solve problems of multi-layer mask alignment, thickness of photoresist spin...”
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865“... used the LIGA-Like process and thick photoresist to fabricate the microfasteners...”
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866“... lens array with different diameters is presented. By using negative PR (photoresist) as a boundary...”
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867
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868“..., and using the high permittivity material or photoresist as insulator to make periodically poled structure...”
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869“... resist removal. Removal of the photoresist when tetramethylammonium hydroxide stripper was raised to 80°C...”
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870“... processes while photoresist liquid (stripper) is the most important indirect material in photo lithography...”
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871“... improves the recipe of ashing process and extends the processing time to enhance the photoresist removal...”
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872“... (EDM). The mold of microelectrode is fabricated by SU-8 thick film negative photoresist. Utilizing...”
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873“... photoresist is used to be sacrificial layer. Membrane structure is manufactured by aluminum in thermal...”
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874“... photoresist (AZ-650). The material is evaluated for imprint process. In addition, at present, electrode...”
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875“... heterogeneous microlenses using hydrophilic confinement effect of the SU-8 photoresist by an inkjet printer on a...”
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876“... manufacturing processes (SU-8 photoresist) and micro electroforming manufacturing processes to construct a novel...”
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877“... using a hemispherical glass of radius 2mm. Negative photoresist SU-8 was used to fabricate the mold...”
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878“... negative type photoresist, in order to fabricate sol-gel-glass microlenses on different types of substrates...”
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879“...-layer photoresist process and glass etching to fabricat phase mask are briefly described. ...”
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880“... is fabricated using PDMS by demolding. The mold made of photoresist is manufactured using a microfluidic...”
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