Suggested Topics within your search.
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Photoresists
7
Laser beams
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Gray scale
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Microstructure
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3D microstructures
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Acrylics
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Aqua Regia
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Aqua regia
1
Bacteria
1
Beam system
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Blood
1
Contact position
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Contrast curve
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Curve fitting
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Curve shape
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Cutting edges
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Differential scanning calorimetry
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Diffraction
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Diffraction intensity
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Diffusion
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Direct write lithography
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Direct-write lithography
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Electrodes
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Electromotive force
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Emulsification
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Expensive equipments
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Exposure correction
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Fabrication
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Feature sizes
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Figure of merit
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841“... sub-micron positive photoresist film. This diffraction grating component was using PDMS...”
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842“...) had been used to make a hollow nanorod structure on a S1813 photoresist substrate. Since the cost...”
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843“... spinner to spin coating photo resister , and then the positive photoresist with periodic Bragg surface...”
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844“.... In the experiments, chromium and photoresist are used as wet etching mask and ion implantation mask. He+ ion...”
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845“... performed successfully after solving photoresist uniformity issue, and the optimal nanoimprinting recipes...”
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846“... by using ion-implantation and wet-etching techniques. In the experiments, chromium and photoresist are used...”
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847“... care dimensions on the border with photoresist or other masking coating....”
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848“... photoresist to produce high quality structures while retaining the extraordinary chiral optical activity...”
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849“... (NSP)—to produce a large area of uniform nanopatterns in the photoresist utilizing the silica...”
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850“... for predicting the necessary combinations of these powders with SU8 2000 Negative photoresist. The magnetization...”
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851“... gold thin films, we introduce a gold deposition step on SU-8 photoresist prior to UV exposure but after...”
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852by Bhimji, Alyajahan“...The negative epoxy-based photoresist of SU-8 has a variety of applications within...”
Published 2013
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853by Bhimji, Alyajahan“...The negative epoxy-based photoresist of SU-8 has a variety of applications within...”
Published 2013
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854“... require a proper photoresist, mask, UV light exposure, developing, and electroplating as a preprocess...”
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855
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856by Rajabi, Mina“... shunt or bulk leakage are investigated by dark current temperature dependence analysis. By photoresist...”
Published 2012
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857“... of negative photoresist SU8, this interference was employed to fabricate microlens array directly. Using...”
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858“... and micro-wells have been made out of the commercially available SU-8 photoresist, using the direct laser...”
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859“... introduced. Several fabrication methods, including a thin film coating with photoresist, high permittivity...”
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860“... micro DMFC stack. Utilize negative type JSR-120N photoresist, with exposure the graph by lithography...”
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