Suggested Topics within your search.
Suggested Topics within your search.
Photoresists
7
Laser beams
3
Gray scale
2
Microstructure
2
3D microstructures
1
Acrylics
1
Aqua Regia
1
Aqua regia
1
Bacteria
1
Beam system
1
Blood
1
Contact position
1
Contrast curve
1
Curve fitting
1
Curve shape
1
Cutting edges
1
Differential scanning calorimetry
1
Diffraction
1
Diffraction intensity
1
Diffusion
1
Direct write lithography
1
Direct-write lithography
1
Electrodes
1
Electromotive force
1
Emulsification
1
Expensive equipments
1
Exposure correction
1
Fabrication
1
Feature sizes
1
Figure of merit
1
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801“... is used to expose. Instead of SU82002, mixed photoresist (SU82002/S1818) is more suitable to fabricate...”
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802“... thicknesses of photoresist AZ4620 will be tried for micro-optical templates with different radiuii. Also...”
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803“... technique were utilized. So far, the photoresist pattern with a period of 0.22 micro-meter...”
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804“... method with imprinting lithography technique. At frist, masters were made froms1818 photoresist...”
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805“... of dry film resist lamination in micro-fabrication processes. Compared to the photoresist spin coating...”
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806“... used the photoresist with different thickness to developing, and then the groove will get...”
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807“... the viscosity of the polymer photoresist when polymer layer is heat to turn into melt state. In the experiment...”
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808by 林哲誼“... ether (PGME) and propylene glycol methyl ether acetate (PGMEA) is widely used as photoresist edge bead...”
Published 2009
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809by 陳宗聖“... microstructure on both sides. Besides, the spill electroplating technology, electroplating over the photoresist...”
Published 2004
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810“... different approach of the nucleation method, the diamond powder/photoresist mixture method, was used...”
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811“... negative photoresist JSR-120N is used in the lithographic process. Hence the process parameters of the soft...”
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812“...) mold insert with micro-structure array using dry-film photoresist (ORDYL P50120) in lithography process...”
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813“... mirror structure are both made by bulk micromachining. By the good adhesion ability of photoresist AZ4620...”
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814“... of nozzle plate for a nebulizer. We use semiconductor photoresist to form the patterning and then make...”
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815“... e-beam lithography. The pattern in a photoresist is first formed by applying...”
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816“... waveguide (CPW) and actuated membrane was made with Au(using photoresist as sacrificial layer). In order...”
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817“... Al and Cr or Cu and Ti with compound structure, and the photoresist was used as the sacrificial layer...”
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818by Hsiao Chao-Jen, 蕭昭仁“... photoresist of 20 um as the etching mask, and success to fabricate blue LEDs by excimer laser etching...”
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819by 趙葉勤“... by the chemical corrosion, external force, and photoresist scum. In the paper, several inspection criteria, Which...”
Published 1998
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820“...) of single human red cell. In the soft lithography technique, the master was made from SU-8 photoresist...”
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