Suggested Topics within your search.
Suggested Topics within your search.
Photoresists
7
Laser beams
3
Gray scale
2
Microstructure
2
3D microstructures
1
Acrylics
1
Aqua Regia
1
Aqua regia
1
Bacteria
1
Beam system
1
Blood
1
Contact position
1
Contrast curve
1
Curve fitting
1
Curve shape
1
Cutting edges
1
Differential scanning calorimetry
1
Diffraction
1
Diffraction intensity
1
Diffusion
1
Direct write lithography
1
Direct-write lithography
1
Electrodes
1
Electromotive force
1
Emulsification
1
Expensive equipments
1
Exposure correction
1
Fabrication
1
Feature sizes
1
Figure of merit
1
-
61by Mei-Hsiu Chiu, 邱美秀“... surface method (RSM), analyze the optimal level of negative photoresist prescription, and set overhang...”
Get full text
Others -
62“... of photoresister and inorganic film. We will use difference materials to block moisture. Difference vacancy...”
Get full text
Others -
63“..., traditional Diazo-Novolak photoresist can not be used because of very low transmittance in Deep-UV wave length...”
Get full text
Others -
64
-
65“.... Photography is frequently differentiated into two parts: tracking and scanning. Photoresist film thickness...”
Get full text
Others -
66“... exposure time will allow sufficient energy to pass through photoresist, thus enabling the photoacid...”
Get full text
Others -
67by 吳瑞龍“...碩士 === 國立成功大學 === 化學工程研究所 === 81 === A positive working photoresist was prepared by the new...”
Published 1993
Get full text
Others -
68“... fabrication. In order to maintain defect -free condition for the subsequent processes, photoresist must...”
Get full text
Others -
69“... photoresist was performed in this study. The t-BOC content in the t-BOC-protected poly(p...”
Get full text
Others -
70“...博士 === 國立臺灣大學 === 化學工程學研究所 === 89 === The thesis is focused on the ArF photoresist which is the key...”
Get full text
Others -
71“... photoresist and the substrate through the priming process in semiconductor manufacturing. First, we...”
Get full text
Others -
72“...碩士 === 國立暨南國際大學 === 光電科技碩士學位學程在職專班 === 105 === The purpose of photoresist development...”
Get full text
Others -
73
-
74“... methacrylate (MMA). The copolymers were used to prepared negative tone photoresist with PAG. Polymer...”
Get full text
Others -
75“... glycol ether, the previous photoresist solvent, was proofed by animal studied. Therefore, the propylene...”
Get full text
Others -
76“...碩士 === 國立高雄大學 === 電機工程學系-電子構裝整合技術產業碩士專班 === 106 === This thesis is to study the photoresist...”
Get full text
Others -
77“...碩士 === 崑山科技大學 === 機械工程研究所 === 92 === Interest in thick positive photoresist of AZ4620 applications...”
Get full text
Others -
78
-
79“...In this work we study the properties of the surface, obtained by applying Noa 81 photoresist...”
Get full text
Article -
80