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Photoresists
7
Laser beams
3
Gray scale
2
Microstructure
2
3D microstructures
1
Acrylics
1
Aqua Regia
1
Aqua regia
1
Bacteria
1
Beam system
1
Blood
1
Contact position
1
Contrast curve
1
Curve fitting
1
Curve shape
1
Cutting edges
1
Differential scanning calorimetry
1
Diffraction
1
Diffraction intensity
1
Diffusion
1
Direct write lithography
1
Direct-write lithography
1
Electrodes
1
Electromotive force
1
Emulsification
1
Expensive equipments
1
Exposure correction
1
Fabrication
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Feature sizes
1
Figure of merit
1
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681“... and photoresist film and smaller stresses of coated HMDSO films are shown for higher O2/HMDSO flow rate ratios...”
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682“... casting film in this work. Secondly, photolithography characteristics of the photoresist films under...”
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683by Kaschny, Jorge Ricardo de Araujo“... in to photoresist. With this aim we have implanted at 80 K AZ1350 samples with Xe and Kr. The concentration profiles...”
Published 2012
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684by Kaschny, Jorge Ricardo de Araujo“... in to photoresist. With this aim we have implanted at 80 K AZ1350 samples with Xe and Kr. The concentration profiles...”
Published 2012
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685by Kaschny, Jorge Ricardo de Araujo“... in to photoresist. With this aim we have implanted at 80 K AZ1350 samples with Xe and Kr. The concentration profiles...”
Published 2012
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686by Cescato, Lucila Helena Deliesposte, 1957-“... negative photoresist. Through this process, which need no chemical development, the photoresist can be used...”
Published 1980
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687by 蕭文裕“...碩士 === 國立臺灣大學 === 光電工程學研究所 === 90 === We characterize thick film photoresist SU-8...”
Published 2002
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688by 曾士芫“...-dimensional periodic gratings on the SU-8 negative photoresist, which is deposited by spin coating onto glass...”
Published 2007
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689“... the normal magnetic force instead of the tangential one, is designed. On the basis of thick photoresist...”
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690by Rosamond, Mark“... scale lithography and thick photoresist sacrificial layers. Detailed analysis of the fabrication method...”
Published 2009
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691“... photoresist is widely used within the microelectromechanical systems (MEMS) community and is well known...”
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692by Rubio, Jose Enrique“... is manufactured by patterning the venation network using photoresist SU-8 on a Kapton film for the assembling...”
Published 2017
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693“... film photoresist liquid. (2) The micro electroforming process is used to transform Ni...”
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694“...-electromechanical system (MEMS) with etched optical fibers processes and SU-8 3050 photoresist to production long...”
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695by Hao Wu, Biao Tang, Robert A. Hayes, Yingying Dou, Yuanyuan Guo, Hongwei Jiang, Guofu Zhou“... photoresist using slit coating on this normally extremely hydrophobic layer. In this way, we are able...”
Published 2016-08-01
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696“... and the exposure dose on the surface of the photoresist, but also the dependence of the exposure depth...”
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697by Møinichen, Christine“... and test it. A routine was established using the negative photoresist ma-N405. The photoresist...”
Published 2012
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698by Al-Maawali, Hanna“... deposited on the crystal and on top of it a layer of photoresist was spun. The mask was transferred...”
Published 2011
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699“... of detection, are needed to be improved. A dry-film photoresist-based microchip using a combination...”
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700“... is scaled down. To address this challenge, the photoresist point-spread function of NFL with a contact...”
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